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From:
Published online 2017 September 6. doi: 10.1038/s41598-017-11412-9

Figure 5

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Scanning electron micrographs show microstructure of wheat seed surface. Top image (100x magnification): a square can be seen following sputtering of 400 × 400 µm area during ToF-SIMS depth profiling. Letters A (outside the sputtered area) and B (inside the sputtered area) mark regions shown in higher magnification (10,000x) in the middle and bottom images, respectively.

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