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Bioinorg Chem Appl. 2012; 2012: 850390.
Published online Nov 24, 2011. doi:  10.1155/2012/850390
PMCID: PMC3228349
Analysis of the Release Characteristics of Cu-Treated Antimicrobial Implant Surfaces Using Atomic Absorption Spectrometry
Carmen Zietz, 1 * Andreas Fritsche, 1 Birgit Finke, 2 Vitezslav Stranak, 3 Maximilian Haenle, 1 Rainer Hippler, 3 Wolfram Mittelmeier, 1 and Rainer Bader 1
1Biomechanics and Implant Technology Research Laboratory, Department of Orhtopeadics, University of Rostock, Doberaner Straβe 142, 18057 Rostock, Germany
2Leibniz Institute for Plasma Science and Technology (INP e.V. Greifswald), Felix-Hausdorff-Straβe 2, 17489 Greifswald, Germany
3Institute of Physics, Ernst-Moritz-Arndt University of Greifswald, Felix-Hausdorff-Straβe 6, 17487 Greifswald, Germany
*Carmen Zietz: carmen.zietz/at/med.uni-rostock.de
Academic Editor: Reinhard Paschke
Received September 1, 2011; Accepted October 24, 2011.
Abstract
New developments of antimicrobial implant surfaces doped with copper (Cu) ions may minimize the risk of implant-associated infections. However, experimental evaluation of the Cu release is influenced by various test parameters. The aim of our study was to evaluate the Cu release characteristics in vitro according to the storage fluid and surface roughness. Plasma immersion ion implantation of Cu (Cu-PIII) and pulsed magnetron sputtering process of a titanium copper film (Ti-Cu) were applied to titanium alloy (Ti6Al4V) samples with different surface finishing of the implant material (polished, hydroxyapatite and corundum blasted). The samples were submersed into either double-distilled water, human serum, or cell culture medium. Subsequently, the Cu concentration in the supernatant was measured using atomic absorption spectrometry. The test fluid as well as the surface roughness can alter the Cu release significantly, whereby the highest Cu release was determined for samples with corundum-blasted surfaces stored in cell medium.
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